Analyseur de gaz in-situ TDLS
L’analyseur de gaz in-situ TDLS été conçu afin de s’adapter aux contraintes d’une large gamme d’applications pour le contrôle des émissions et du process.
Le LAS 5000XD TDLS (Spectroscopie par Diode Laser Accordable) existe en plusieurs modèles et mesure une large gamme de paramètres tels que NH3 + H2O, HF, CO + CO2, O2, HCl + H2O, etc.
Il conjugue robustesse et rapidité de réponse (1 s) avec une grande précision de mesure dans des environnements difficiles (prêt pour la zone Ex II).
Bénéfices clés pour l’utilisateur de l’analyseur de gaz LAS 5000XD TDLS :
- Aucun système d’échantillonnage nécessaire
- Pas d’influence de la température du gaz
- Pas d’interférence de la matrice gazeuse
- Mesure sans étalonnage
Grâce à la fonctionnalité ClearPath, les interférences de l’humidité relative, de l’O2 ou du CO2 sont éliminées dans les zones de purge.
- KEY FEATURES
- New Embedded ClearPath functionality
- Highly sensitive and selective measurement
- High signal-to-noise ratio
- No measurement drift
- Response time 1 s
- Large dynamic range from ppm to %
- Real-time communication between Transmitter (Tx) and Receiver (Rx)
- Robust, ready for Ex Zone II (certification to come)
- 💡 CLEARPATH
- Interference of relative humidity, O2 or CO2 is removed in purging areas.
- Operator’s benefits:
- No need for N2 or dry air purge
- High accuracy of O2 measurement
- High accuracy of H2O measurement
- High accuracy of CO2 measurement
- CUSTOMER BENEFITS
- Low maintenance and cost of ownership
- No need for N2 or dry air purge: Oil & dust free air instrument is enough
- Process optimization leading to reduction of operating costs
- Ammonia slip control (DeNox)
- Process and combustion control
- HF emission control in aluminum plant
- HCl/SO2 abatement control
- Ethylene cracking furnace control
- HCl level in semiconductor production
- Ammonia concentration control in pet food, fertilizer plants, etc.
Measurable parameters | |||
---|---|---|---|
Pollutant | Range | ||
NH3 + H2O | 0–10 ppm / 0–5000 ppm + 0–5% / 0–50% | ||
HF | 0–3 ppm / 0–500 ppm | ||
CO ppm + H2O | 0-50 ppm / 0-1% + 0-10% / 0-50% | ||
CO% + H2O | 0-1% / 0-100% + 0-10% / 0-50% | ||
CO% + CO2 | 0-1% / 0-100% + 0-1% / 0-100% | ||
CO2 + H2O | 0-1% / 0-100% + 0-10% / 0-50% | ||
O2 | 0-1%/ 0-100% | ||
HCl + H2O* | 0-10 ppm / 0-5000 ppm + 0-10% / 0-50% (*gas temperature must be above 150°C). | ||
Other gases | Available upon request: CH4, H2S, H2, NO… |
Technical Specifications | |
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Technology | ADLAS (Advanced Detection Laser Absorption Spectroscopy) • Optimized Opto-Mechanical Design • High Speed Low-Drift Electronics • Powerful Signal Processing and Algorithm • Independent Spectroscopy Technique |
Lower Detection Limit | < 1% of FS |
Response Time (0–90%) – Short | 1 s |
Lack of fit/Linearity | ≤ ±1% |
Flue Gas Temperature (°C max) NH3 + H2O / HCl + H2O / HF CO + H2O / O2 / CO + CO2 |
+400°C (Depends on the concentration range) +1200°C (Depends on the concentration range) |
Flue Gas Pressure | 2 bars max (absolute) |
Display on Tx | 4 x 20 LCD |
Communication | Modbus RTU (RS485) / Ethernet (RJ45) – Web server |
Power supply type | + 24 V DC, ripple and noise 50 mV |
Power consumption | 15 W (warm-up) < 15 W in standard use |
Recommended T° (ambient) | -20°C to +55°C |
IP index Tx & Rx enclosures | IP65 |
Flange specification requirement on stack | DN50 PN16, 2’’ – 150 lbs, Class 150 |
Flange material | SS 316 L |
Air consumption (main purge – necessary) |
5-50 L/min (to adjust according to site conditions) (dry and oil free, ISO 8573.1 Class 2-3) |
Air consumption (secondary purge – recommended) |
2-3 L/min (dry and oil free, ISO 8573.1 Class 2-3) |
Stack diameter compatibility | From 0.5 to 20 m |
pressure = 1013 mbar / pathlength = 100 cm / ambient temperature = 25 °C
Options | |
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Junction Box | Analog I/O (2 x 4-20 mA/2 x 4-20 mA) – Digital Output (2 relays) |
Thermal Shield | Thickness: 20 mm (100°C<Tp<300°C) ; 40 mm (300°C<Tp<600°C) ; 60 mm (Tp above 600°C). |
Audit Cell | |
Inline Cell | |
Alignment Tool | |
Weather protection covers |